Devices, Instrumentation and Methods
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DualBeam FEI Scios
- SEM-FIB device for 3D investigations
- EDAX analytics with EDS, WDS and EBSD for chemical analyses and crystallographic investigations
- in-situ tensile/compression testing up to 5 kN
- in-situ heating stage up to 1000 °C
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FEI XL30
- field emission cathode Scanning Electron Microscope
- EDAX analytics with EDS and EBSD for chemical analyses and crystallographic investigations
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Zeiss EVO 15
- Scanning Electron Microscope with EDS for materials characterization
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Quorum Q150T ES sputtering device
- sputtering device for SEM preparation of non-conductive samples
- target materials: chromium, platinum, tantalum, titanium
- gas: argon
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Emitech K550 sputtering device
- sputtering device for SEM preparation of non-conductive samples
- target material: gold
- gas: argon
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Buehler VH3300 automatic microhardness tester
- microhardness testing according to Vickers
- automatic rotating turret, magnifications: 5x to 200x
- 4-position sample clamping device (sample diameter: 20/30 mm)
- measuring range: HV0,01 - HV5
- analysis software: DiaMet
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Experimental lab for materials analysis methods
- new and advanced development of microscopic and analytical methods
- development and testing of X-ray sources for X-ray fluorescence analysis (XRF)
- imagigng X-ray methods
- X-ray spectroscopy
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